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Ships within 48 hours · Estimated delivery Jul 27 - Aug 1
Power Supply Configuration: The rack can accommodate one or two power supplies
Origin: Sweden
Source VT Ratio: 1 to 5000 in steps of 1
in original packaging
Global Availability: Stocked in ABB warehouses across Europe and Asia
APPLIED MATERIALS 0010-59787 Ceramic Heater Single Board Computer Power Supply Configuration: The rackDescription The AMAT 0010 59787 PECVD reactor is a deposition chamber designed to deposit thin films or layers onto substrates used in various electronic devices and systems. The system employs a Chemical Vapor Deposition (CVD) process to deposit the desired film material onto the surface of the substrate. Specifications Reactor Type: PECVD (Plasma Enhanced Chemical Vapor Deposition) Substrate Loading: Automated single loading chamber Integrated